VLSI Fabrication Principles: Silicon and Gallium Arsenide
Download VLSI Fabrication Principles: Silicon and Gallium Arsenide By Sorab K. Ghandhi – Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits.
VLSI Fabrication Principles: Silicon and Gallium Arsenide By Sorab K. Ghandhi – Book PDF Free Download
Book Details:
Title Of The Book | VLSI Fabrication Principles: Silicon and Gallium Arsenide |
Author’s Name | Sorab K. Ghandhi |
Publishers | Sorab K. Ghandhi |
File Size | 38.5 MB |
File Type |
Table Of Content:
- Material Properties
- Phase Diagrams and Solid Solubility
- Crystal Growth and Doping
- Diffusion
- Epitaxy
- Ion Implantation
- Native Films
- Deposited Films
- Etching and Cleaning
- Lithographic Processes
- Device and Circuit Fabrication
- Appendix The Mathematics of Diffusion
- References
- Index
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